We are pleased to announce the technical program for ISVLSI 2105 - available here as a pdf).
This Symposium explores emerging trends, novel ideas and concepts in the area of VLSI. The Symposium covers a range of topics: from VLSI circuits, systems and design methods to system level design and system-on-chip issues, to bringing VLSI experience to new areas and technologies like nano- and molecular devices, MEMS, and quantum computing. Future design methodologies will also be one of the key topics at the workshop, as well as new CAD tools to support them. Over almost two decades the symposium has been an unique forum promoting multidisciplinary research and new visionary approaches in the area of VLSI. The Symposium is bringing together leading scientists and researchers from academia and industry. The papers from this symposium have been published as the special issues of top archival journals. This fact indicates a very high quality of the sympo-sium papers, and we are determined to keep a strong emphasis on this critical aspect of any conference. The symposium proceedings are published by IEEE Computer Society Press. The Symposium has established a reputation in bringing well-known international scientists as invited speakers, and this trend will continue.
Contributrions are sought in the following areas: Emerging Trends in VLSI, Nanoelectronics, Molecular, Biological and Quantum Computing. MEMS, VLSI Circuits and Systems, Field-programmable and Reconfigurable Systems, System Level Design, System-on-a-Chip Design, Application-Specific Low Power, VLSI System Design, System Issues in Complexity, Low Power, Heat Dissipation, Power Awareness in VLSI Design, Test and Verification, Mixed-Signal Design and Analysis, Electrical/Packaging Co-Design, Physical Design, Intellectual property creating and sharing.
The Symposium Program will include contributed papers and speakers invited by the Program Committee, as well as a poster session. The keynote addresses, panels and special sessions are planned as well. Authors should submit their original work using the web based submission system. Initial submissions to the conference are limited to six pages. ISVLSI uses double blind review mechanism and authors information should not be provided in the initial manuscript. All submissions should be in PDF format.
We are pleased to announce the technical program for ISVLSI 2105 - available here as a pdf).
We are pleased to announce Student Funding Grants for travel to and best paper at ISVLSI 2015 sponsored by The Technical Committee on VLSI of the IEEE Computer Society (TCVLSI):
The Symposium Program will include contributed papers and speakers invited by the Program Committee, as well as a poster session.
The ISVLSI 2015 technical program will include Special Sessions. These sessions are meant to complement the regular sessions by giving a broad overview on a new and emerging topic of interest to the ISVLSI community.
for Special Sessions!
The ISVLSI 2015 technical program will include Special Sessions. These sessions are meant to complement the regular sessions by giving a broad overview on a new and emerging topic of interest to the ISVLSI community.
Read the full Special Session Call here
Submit you proposal now
Supported by the
The venue's address is:
Faculté de Médecine de Montpellier
2 Rue de l'Ecole de Medecine
34000 Montpellier
France
By plane, you can either use the Lyon / Paris hub (flight from Lyon or Paris to Montpellier takes around 1h) or use the low cost companies in and around Montpellier. Check RyanAir and EasyJet for further details. Please note that around Montpellier there will be several airports such as Beziers, Avignon or Carcassonne opened during the summer. Marseille or Lyon are at around 2h by train from Montpellier.
Please note that there are several international destinations accessible on direct trains (Valencia, Barcelona, Bruxelles). To book your train ticket you can use the Voyages SNCF website. The sooner you book your ticket the cheaper it is. Since Montpellier is a very popular touristic destination during the summer, we advise booking in advance.
The Montpellier Mediterranean International Airport (MPL) is located 10 km from downtown.
When arriving at the airport there are two possibilities. Either take a shuttle bus in front of the terminal, or take a taxi.
Please visit this external site to book your accomodations!
Technological breakthroughs have led to enormous improvements in performance, power, functionality and cost of computing devices and have thus enabled 50 years of Moore’s law. Cost per function has decreased several thousand fold, while system performance and reliability have been improved dramatically. Today conventional silicon transistor scaling is approaching fundamental physical limits. For example, the increasing power dissipation on the chip level is one of the key challenges. Rising leakage currents and the increasing difficulty to further reduce the supply voltage have impacted the passive and active power dissipation, limiting the overall performance. Therefore a key attribute of any new device that may be considered for replacing the conventional field-effect transistor (FET) is reduced power dissipation. In that respect new strategies, including the use of novel materials, innovative device architectures and device concepts need to be explored and assessed.
Attention has turned to III–V compound semiconductors that are well positioned to replace silicon as the base material in logic switching devices. Their outstanding electron transport properties and the possibility to tune heterostructures provide tremendous opportunities to engineer novel nanometerscale logic transistors. The scaling constraints require an evolution from planar III–V metal oxide semiconductor field-effect transistors (MOSFETs) toward transistor channels with a three-dimensional structure, such as nanowire FETs, to achieve future performance needs for complementary metal oxide semiconductor (CMOS) nodes beyond 10 nm.
Carbon nanotubes (CNT) represent another class of semiconductor materials possessing transport properties more attractive than silicon to lower operation voltage and thus power consumption of MOSFETs. The superior low-voltage performance of sub-10 nm CNT transistors proves the viability of nanotubes for consideration in future aggressively scaled transistor technologies. Still challenges such as precise positioning and low contact resistance remain for large-scale integration.
Further device innovations are required to increase energy efficiency. This could be addressed by devices with a steeper subthreshold slope compared to MOSFETs to enable scalingof voltage supply and future low-power designs. In that regard, tunnel FETs (TFETs) are very promising as they allow to achieve a subthreshold swing of below 60 mV/dec. at room temperature by utilizing band-to-band-tunneling (BTBT) for charge injection. To achieve the required TFET performance boosters such as heterostructures are needed to lower the effective tunnel barrier and enable steep slope and high on-currents.
This presentation describes the challenges and recent progress toward the most prominent candidates for becoming the next nanoelectronic switch where new materials, architectures and devices are crucial.
PAs CMOS technologies continue to scale and devices become more interconnected, new reliability challenges are emerging. With Internet-of-Things, semiconductor devices will be ubiquitous and used under diverse environmental conditions. In this paper we will review the device level scaling challenges from the reliability perspective, which include new materials, variability in ever decreasing dimensions, and methodology enhancements needed to provide reliable solutions across different product segments. The critical need for product level reliability assessment will be highlighted to provide additional margin for the consumer market.
As we move towards the sub 20 nm regime, a convergence of application is occurring in the product segment. As shown in Fig. 1, a typical product like a cell phone currently provides not only enhanced computing power (CPU and GPU) but also encompass many sensors such as accelerometers, gyroscopes, and microphone. As we move towards IoT, connecting devices and ensuring a secure and reliable data collection/transfer will be critical. All of this must come at a reduced cost and shorter development times. The trade-off between power and performance becomes more demanding as well. Reliability of individual components may need a re-evaluation and assessing over all product reliability where failure of any one of the diverse components leads to product failure needs to be addressed.
The power performance trade off in device scaling, has been addressed via material changes and device architecture change. Material changes include introduction of Hf-based HK dielectric stacks to replace SiON gate dielectric. Ultra Low K dielectrics for Back end of Line dielectrics and material/interface optimization for EM. For sub 10nm technologies new channel materials such III-V and SiGe are being explored along with FINFET and Gate all around Nanowire. Each of these approaches brings new challenges and solutions to technology scaling. A third component of scaling is managing variability both at Time zero and those induced due to defect generation under operating conditions. Understanding and modeling these variability components is also critical for future nodes. Finally, it is critical to correlate the device level learning to product operation. Starting block for such studies can be ring oscillators for logic and small array of SRAM for memory. Implication of device degradation over time on Logic and SRAM Vmin needs to be understood and appropriate guard band is needed during technology definition.
In this presentation, we summarize reliability challenges due to material change in current and future technology nodes. We will provide an overview of key physical mechanisms which are impacted due to change in gate dielectric stack from SiON to HK MG. A short overview of the changes in BEOL material and its impact on electro-migration and ILD TDDB will be discussed. Move to FINFETs with III-V channel material will be briefly touched. Impact of variability both time zero and post stress will be elaborated. Current and future approaches to bridge the gap between Wafer Level Reliability and product level reliability challenges will be highlighted.